Intern - ADTS PEE Dry Etch

Our vision is to transform how the world uses information to enrich life for all. Join an inclusive team passionate about one thing: using their expertise in the relentless pursuit of innovation for customers and partners. The solutions we build help make everything from virtual reality experiences to breakthroughs in neural networks possible. We do it all while committing to integrity, sustainability, and giving back to our communities. Because doing so can fuel the very innovation we are pursuing. Project Title Cumulative Error Variation Reduction in Staircase and Chop Etch Processes Project Description Analyze manufacturing process and measurement data to identify sources of cumulative error variation within advanced-technology staircase and chop etch processes. Develop data-driven control strategies and process improvement recommendations to reduce variation and improve inline process stability. The project will provide exposure to dry etch processes, staircase flow integration, statistical analysis, data visualization, and the etching mechanisms relevant to semiconductor process control. Project Scope Understand the measurement methodology and process mechanisms used to define cumulative error within the staircase formation loop. Analyze process and measurement data to identify factors contributing to cumulative error variation. Apply statistical analysis and data visualization techniques to evaluate relationships between process conditions and cumulative error performance. Develop potential control strategies to reduce cumulative error variation.