Intern - EUV & Materials Lithography

Our vision is to transform how the world uses information to enrich life for all . Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever. This internship offers hands-on exposure to advanced semiconductor exploration and engineering progress in EUV lithography and materials engineering. The role supports technology innovation that enables next-generation memory and semiconductor products through close collaboration with multi-functional process engineering teams. As an EUV Lithography & Materials Intern based in Boise, Idaho, you will contribute to projects focused on photolithography process development, materials optimization, and patterning performance improvements. You will partner with engineers across Photolithography, Metrology, Dry Etch, Wet Process, and related fields to complete research initiatives, analyze data, and communicate technical findings. During the internship, you will complete two to three project assignments supporting current and future semiconductor manufacturing technologies. Responsibilities Design and implement experiments using Design of Experiments (DOE) methodologies to optimize photolithography processes, including EUV lithography, photoresist development, and related patterning applications. Plan, coordinate, and perform experiments in semiconductor cleanroom environments, including collaboration with remote fabrication facilities when required.