Intern - Process Pathfinding, DRAM Dry Etch

Our vision is to transform how the world uses information to enrich life for all . Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever. At Micron, the Process Pathfinding organization develops next-generation semiconductor memory technologies and innovative device architectures. The team focuses on advancing process technologies that enable future memory products through fundamental research, process integration, and collaboration across engineering fields. This is an outstanding opportunity to contribute to innovative semiconductor development in a fast-paced, knowledge-focused environment. As a DRAM Dry Etch Process Pathfinding Intern, you will support the development of advanced plasma etch processes for emerging memory technologies. Working alongside experienced engineers and multi-functional partners, you will gain hands-on experience with dry etch equipment, semiconductor process development, materials characterization, and data-driven problem solving. This role provides exposure to advanced manufacturing environments while contributing to process solutions that improve device performance and reliability. Responsibilities Conduct experiments and fundamental research to develop innovative dry etch solutions for next-generation memory technologies. Partner with the Pathfinding team to develop and optimize dry etch processes that meet physical and electrical performance requirements.